The chemical vapour deposition (CVD) of polysilicon in Siemens reactors remains a cornerstone process in the manufacture of high-purity silicon for semiconductor and photovoltaic applications. The ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

The semiconductor industry continually pushes the boundaries of device performance through advanced process modelling and epitaxial growth techniques. In this context, sophisticated simulation methods ...

CVD Equipment Corporation (NASDAQ: CVV), today announced that they received an order for two PVT150™ Physical Vapor Transport Systems from Stony Brook University (SBU) for their new semiconductor ...

LONDON--(BUSINESS WIRE)--Market research firm Technavio has announced the release of an updated report on the global semiconductor CVD equipment market. This new report will provide expert market ...

Modern semiconductor devices require the deposition of thin films onto surfaces with increasingly complex structures characterized by high aspect ratios (AR) and small feature sizes. SC is a measure ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...

Sathvik Ajay Iyengar is a doctoral student at Rice and a first author, along with Rice doctoral alumnus Lucas Sassi, on a study published in ACS Electronic Materials. HOUSTON – (Aug. 20, 2025) – A ...