Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features Nanoimprint ...

Nanoimprint lithography (NIL) encompasses a suite of high-resolution, high-throughput patterning methods in which a mould bearing nanoscale features is pressed into a deformable resist to transfer ...

Dip Pen Nanolithography (DPN), a direct-write soft lithography method, is used to develop nanostructures on a preferred substrate by offering sets of molecules through capillary transport from an ...

(Nanowerk Spotlight) Nanoimprint lithography (NIL) has developed into a key technique for the fabrication of polymer nanopatterns and three-dimensional (3D) nanostructures. At its core, NIL is a ...

Nanoimprint lithography (NIL) is re-emerging amid an explosion of new applications in the market. Canon, EV Group, Nanonex, Suss and others continue to develop and ship NIL systems for a range of ...

Photonic-based devices such as light-emitting diodes (LEDs), lasers and photovoltaics Micro arrays and nano-devices for medical devices and bioengineered applications Advanced storage media, including ...

Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an ...

Step-and-repeat nanoimprint lithography (NIL) is a promising technique to replicate nanoscale patterns at low cost across a large area. Last year, researchers Christophe Peroz and Scott Dhuey and ...

Recently, the Japanese semiconductor equipment manufacturer Canon released the nanoimprint lithography (NIL) machine FPA-1200NZ2C, capable of achieving a 5-nanometer process node. Nanoimprint ...

Nanoimprint has been discussed, debated, and hyped since the term was first introduced in 1996. Now, a full 20 years later, it is being taken much more seriously in light of increasing photomask costs ...